Functional Nanocrystalline Films of Silicon Carbonitride
Nadezhda I. Fainer, Yuri M. Rumyantsev and Marina L. Kosinova
Institute of Inorganic Chemistry, Siberian Branch
of the Russian Academy of Sciences, Pr. Akademika Lavrentyeva 3,
Novosibirsk 630090 (Russia),E-mail: nadezhda@che.nsk.su
Abstract
The films of a new ternary compound, silicon carbonitride, were synthesized by means of plasma enhanced deposition (PECVD) using hexamethyldisilazane Si2NH(CH3)6 as the precursor. Different investigation methods, namely, IR and Raman spectroscopy, XPS, ellipsometry, electron microscopy, including high-resolution me-thods (HRTEM, SAED) were applied to study physico-chemical properties of the films. Much attention was paid to the development of the X-ray phase analysis methods involving synchrotron radiation to determine the structure and phase composition of thin films. It was established that the silicon carbonitride films contain nanocrystals 2-5 nm in size distributed over the amorphous matrix.
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