A New Ecologically Safe Method of the Deposition of Silicon Nitride Layers in a Quasi-Closed Low Pressure Reactor
a:2:{s:4:"TYPE";s:4:"TEXT";s:4:"TEXT";s:76:"Ol'ga. I. Semyonova, Konstantin P. Mogil’nikov and Sergey M. Repinsky";}
Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences, Pr. Akademika Lavrentyeva 13, Novosibirsk 630090 (Russia)
