Mechanochemical Sense of the Technology of Chemical Mechanical Polishing of Materials
A. S. ARTEMOV
Prokhorov Institute of General Physics, Russian Academy of Sciences, Ul. Vavilova, 38, Moscow 119991 (Russia)
E-mail: artpoliofan@mail.ru
Keywords: chemical and mechanical polishing, amorphous SiO2 particles, polishers, single crystals, mechanochemical activation
Pages: 561–568
Abstract
Interpretation of the mechanochemical aspect from the viewpoint of the manifestation of P. A. Rebin-der effect is proposed on the basis of the experimental investigation of the kinetics and mechanism of the processes taking place during chemical mechanical polishing semiconductors, dielectric and metal crystals. The possibility of the tribochemical activation of chemical reactions by the flow of liquid silica sols under the joint action of chemical mechanical factors on the surface is demonstrated. It is established that solid particles promote activation and localization of chemical reactions on the surface of crystals on the atomic scale, and removal of the products of chemical reactions in the nanoscale. As a result, a mirror-smooth surface with subnanosecond relief is formed; containing no micro and nano scratches, pits, etched regions and other microdefects.
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