Thermodynamic Simulation of Separation Processes of Gaseous Hydrogen-Hydrogen Chloride Mixtures by the Method of Absorption with Chlorosilanes for the Purpose of Hydrogen Reentry into the Process Cycle of Semiconductor Silicon Preparation
V. A. Titov, L. I. Chernyavskiy, L. A. Borisova, B. A. Shagarov, S. A. Muravitskiy, V. N. Nitkin, V. A. Postnikov
Pages: 359-362
Abstract
The problem of gaseous hydrogen-hydrogen chloride mixture separation with the use of chlorosilanes as sorbents is considered. The possibility of hydrogen purification from HCl up to 0.1 mol. % and its re-entry into the process cycle at the stage of trichlorosilane reduction with hydrogen is demonstrated. The hydrogen chloride purified from admixed chlorosilanes can be used as a reactant for the trichlorosilane production from metallurgical silicon.
|
