Effect of the Flow Rate of the Precursor Gas on the Growth Rate of a Fluoropolymer Coating during Hot Wire Chemical Vapor Deposition
A. I. Safonov1, V. S. Sulyaeva2, A. L. Bogoslovtseva1, N. I. Timoshenko1
1Kutateladze Institute of Thermophysics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090, Russia
2Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090, Russia
Keywords: фторполимер, тонкие пленки, метод HWCVD, газодинамический режим течения, катализатор, fluoropolymer, thin films, HWCVD method, gas dynamic flow regime, catalyst
Abstract
The formation of a fluoropolymer coating by chemical deposition has been studied. It has been found that increasing the flow rate of the precursor gas leads to a decrease in the growth rate of the coating. The conditions deposition was analyzed, and the gas dynamic parameters of the process were estimated. It is shown that the estimates are consistent with experimental data.
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