Publishing House SB RAS:

Publishing House SB RAS:

Address of the Publishing House SB RAS:
Morskoy pr. 2, 630090 Novosibirsk, Russia



Advanced Search

Journal of Applied Mechanics and Technical Physics

2018 year, number 5

Silicon Film Deposition using a Gas-Jet Plasma-Chemical Method: Experiment and Gas-Dynamic Simulation

R. G. Sharafutdinov, P. A. Skovorodko, V. G. Shchukin, V. O. Konstantinov
Kutateladze Institute of Thermophysics, Novosibirsk, 630090, Russia
Keywords: свободная струя, реактор, моделирование, метод DSMC, тонкие пленки кремния, электронно-пучковая плазма, плазмохимическое осаждение, free jet, reactor, simulation, DSMC method, thin silicon films, electron-beam plasma, plasma-chemical deposition

Abstract

This paper presents results of an experimental study, numerical calculation, and analysis within the framework of a gas-dynamic model of silicon film deposition by a gas-jet plasma-chemical method. A numerical model of a flow of gas mixtures, flowing out of an annular nozzle unit and flowing into a reactor, is developed, and it allows one to determine a film thickness distribution over the surface of substrates placed in the reactor and describes the experimental data obtained satisfactorily