X-RAY PHOTOELECTRON STUDY OF THE EFFECT OF THE COMPOSITION OF THE INITIAL GAS PHASE ON CHANGES IN THE ELECTRONIC STRUCTURE OF HEXAGONAL BORON NITRIDE FILMS OBTAINED BY PECVD FROM BORAZINE
E.A. Ilinchik†, I.S. Merenkov
Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia
Keywords: гексагональный нитрид бора, рентгеновская фотоэлектронная спектроскопия, электронное строение, тонкие пленки, PECVD, боразин, наностенки, hexagonal boron nitride, X-ray photoelectron spectroscopy, electronic structure, thin films, borazine, nanowalls
Abstract
Hexagonal boron nitride films are synthesized by plasma enhanced chemical vapor deposition (PECVD) from a gas mixture of borazine and ammonia or helium on a Si(100) substrate. X-ray photoelectron spectroscopy is used to study changes in the electronic structure and chemical composition of the films depending on the composition of the initial gas mixture. It is found that the chemical composition of the samples obtained depends on the gas used. The use of helium results in an excess of boron atoms on the film surface, the appearance of B-B bonds, and a decrease in the contribution of B-N bonds in the hexagonal environment. The preparation of h-BN films close to the stoichiometric composition by PECVD methods with the use of borazine is shown to be possible with the addition of ammonia. Based on the literature data, the binding energies in the B 1 s spectra are calculated for different boron environments in the hexagonal lattice.
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