Structural characterization of iron silicide nanoclusters in Si/FeSi heterosystems using magneto-optic ellipsometry
N. N. Kosyrev, V. N. Zabluda, S. N. Varnakov, V. A. Shvets, S. V. Rykhlitsky, E. V. Spesivtsev, V. Y. Prokop'ev
Keywords: ellipsometry, magneto-optic Kerr effect, molecular beam epitaxy
Pages: 104-108
Abstract
The initial stages of iron film growth on monocrystalline silicon were studied using a combined method of magneto-optic ellipsometry. The growth of iron silicide nanoclusters on the silicon surface was shown to occur at thickness d < 1.2 nm in non-magnetic phase.
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