The Influence of Residual Stress in Optical Windows on Ellipsometric Measurements
V. A. Shvets
Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia
E-mail: shvets@isp.nsc.ru
Pages: 183-188
Abstract
The influence of the residual birefringence in optical windows on the results of ellipsometric measurements is considered. The optical properties of the windows are described by a complex relative transmittance. Corrections to the ellipsometric parameters, which arise in measuring on static ellipsometers, are calculated under the assumption of weak window anisotropy in a linear approximation. Analysis of the obtained relationships shows that the corrections are partly averaged in two-zone measurements. It is found that the optimal position of the windows corresponds to orientation of their optic axes at an angle of 45
|
