Synthesis of titaniferous films by the method of magnetron sputtering in a discharge with a small anode while annealing in nitrogen and air
O.V. Zaitsev1,2, T.I. Gareev1,2, O.A. Nerushev1, D.V. Sorokin1,2, I.V. Korol’kov3, V.S. Sulyaeva3
1Kutateladze Institute of Thermophysics SB RAS, Novosibirsk, Russia
2Novosibirsk State University, Novosibirsk, Russia
3Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk, Russia
Keywords: magnetron, thin film, titanium nitride, titania, external anode, annealing
Abstract
The paper describes a method for the synthesis of titanium carbide films using magnetron sputtering in a small-anode discharge. As a result, the synthesized films exhibit a density lower than that for the films produced by the stan-dard method of magnetron sputtering. The generate coating were subjected to annealing in oxygen-bearing or nitrogen atmosphere. The resulting films were studied using several characteristics and methods: volt-ampere characteristics of the magnetron discharge and the small anode, images from scanning electron microscopy, x-ray phase analysis, resistometry and spectral measurements for optical transparency. Our study demonstrated that the samples synthesized in a setup with an anode are thicker than those synthesized without anode. They also exhibit a smaller size of crystallites, lower transparency, forbidden band and a higher resistance. Taking into account the unchanged regime of magnetron operation, this indicates a reduced film density.
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