The effect of diluting the precursor gas with an inert gas on the structure, composition and wettability of coating deposited by the HW CVD method
A. V. Petrova1, I. N. Lyapustin1, V. S. Sulyaeva2, A. I. Safonov1
1Kutateladze Institute of Thermophysics SB RAS, Novosibirsk, Russia
2Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk, Russia
Keywords: gas flow, dilution, activation, fluoropolymer, morphology, thin films
Abstract
The paper considers a possibility of controlling the structure of a fluoropolymer coating by diluting the precursor gas with an inert gas during synthesis by the Hot Wire Chemical Vapor Deposition method (Hot Wire CVD). Dilution of the precursor gas significantly affects the morphology of the formed coating and alters the coating wettability and the growth rate.
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