ELLIPSOMETRY EQUATION FOR THE STRUCTURE CONSISTING OF A SUBSTRATE AND A UNIAXIAL ANISOTROPIC FILM WITH THE OPTICAL AXIS IN THE PLANE OF INCIDENCE
V. A. Shvets, I. A. Azarov, E. V. Spesivtsev
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia
Keywords: optical anisotropy, ellipsometry, uniaxial crystal
Abstract
A solution to the direct ellipsometry problem is presented for a single-layer model consisting of an isotropic substrate and an anisotropic film in the case of the orientation of the optical axis of the film in the plane of incidence. Analytical expressions for calculating the ellipsometric parameters of such a structure are obtained. A simple numerical algorithm is proposed for determining the ordinary ( no ) and extraordinary ( ne ) refractive indices of a bulk crystal under various measurement conditions. The inverse problem of determining no, ne, and film thickness d when changing the azimuth of the optical axis is considered. The correlation of the required parameters for such a problem is discussed.
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