LASER TECHNOLOGIES IN MICRO-OPTICS. Pt. 2. FABRICATION OF ELEMENTS WITH THREE-DIMENSIONAL MICRORELIEF
A. G. Poleshchuk1, V. P. Korolkov1, V. P. Veiko1,2, R. A. Zakoldaev2, M. M. Sergeev2
1Institute of Automation and Electrometry, Siberian Branch, Russian Academy of Sciences, 630090, Novosibirsk, pr. Akademika Koptyuga, 1
2Institute of Information Technologies, Mechanics, and Optics, 197101, Saint Petersburg, Kronverkskii pr., 49
Keywords: микрооптика, прямая лазерная запись, полутоновая фотолитография, фоторастровый метод, микроплазма, micro-optics, direct laser writing, halftone photolithography, scanning method, microplasma
Abstract
Recent research in the field of formation of 3D microrelief of optical elements with the use of direct laser beam writing at various wavelengths and photolithographic technologies on the basis of photomasks fabricated by means of laser writing is reviewed. Typical characteristics of the relief, as well as advantages and drawbacks of the above-mentioned methods are considered.
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