THE NON-STATIONARY THERMAL PROCESSES ROLE AT THIN FILM DEPOSITION BY THE NANOSECOND LCVD METHOD
D.V. Chesnokov, V.V. Chesnokov, V.N. Moskvin, D.S. Mikhailova
Keywords: LCVD, pyrolytic laser processing, adsorption, thin films, topological pattern, nonlinear phenomena
Abstract
The thermal processes of topological patterns formation by LCVD method with nanosecond and subnanosecond laser pulse duration are investigated. The temperature rate at irradiated spot on surface exert significant influence on resolving power of method, as described. An effect of nonlinear dependence of optical film’s absorption from it’s thickness on initial growth rate of film on transparent substrates is estimated.
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