Microbeam X-ray Lithography Apparatus for Direct Production of Deep LIGA Structures
B. G. Gol’denberg, E. F. Reznikova, A. G. Lemzyakov, V. F. Pindyurin
Budker Institute of Nuclear Physics, Siberian Branch, Russian Academy of Sciences, pr. Akademika Lavrent’eva 11, Novosibirsk, 630090 Russia
goldenberg@inp.nsk.su
Keywords: synchrotron radiation, X-ray lithography, LIGA technology
Pages: 96-102
Abstract
A microbeam X-ray lithography apparatus, a new device for the direct production of microstructures in thick layers of X-ray resists, in particular, for the fabrication of X-ray lithography masks, was developed on the basis at the LIGA station of the VEPP-3 storage ring of the Siberian Center of Synchrotron and Terahertz Radiation. A microstructure pattern with given arbitrary topology was produced directly in a SU-8 negative resist layer up to 1 mm thick on a substrate moved in a vector mode using a collimated beam of synchrotron radiation with a special software. The design of the device and its technological capabilities and limitations are described. Examples of the fabricated microstructures with a high aspect ratio and X-ray lithography masks are presented
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