A study of the structure of (HfO2)x(Al2O3)1-x /Si FILMS BY X-RAY PHOTOELECTRON SPECTROSCOPY
V. V. Kaichev, Y. V. Dubinin, T. P. Smirnova, M. S. Lebedev
Keywords: hafnium dioxide, alumina, hafnium aluminate, binary solution, X-ray photoelectron spectroscopy, layer-by-layer analysis
Pages: 495-502
Abstract
By X-ray photoelectron spectroscopy (XPS), using the technique of layer-by-layer analysis, the films of (HfO2)x(Al2O3)1-x solid solutions synthesized by chemical vapor deposition are studied. The possibility to determine the structure of solid binary solutions based on the analysis of the XPS spectra is demonstrated.
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