Microstructuring of Optical Surfaces: Technology and Device for Direct Laser Writing of Diffractive Structures
A. G. Poleshchuk, A. A. Kutanov, V. P. Bessmeltsev, V. P. Korolkov, R. V. Shimanskii, A. I. Malyshev, A. E. Matochkin, N. V. Goloshevskii, K. V. Makarov, V. P. Makarov, I. A. Snimshchikov, N. Sydyk uulu
Keywords: scanning interference lithography, direct laser writing, diffractive microstructures, chromium films, silicon films
Pages: 86-96
Abstract
Results of development and testing of a scanning system of interference lithography are presented. The system is designed to form diffractive microstructures consisting of microgratings with a specified orientation, a size of 5-10 μm, and a period ranging from 0.6 to 1.5 μm. The total writing field of the system is 300×300 mm. The system is used to study direct laser writing of microgratings on chromium and amorphous silicon films applied by the method of magnetron sputtering onto the glass substrate surfaces. The device and technology of direct writing of microgratings can be further used to form antireflective subwave coatings of optical elements and graphical microstructured identification marks for product protection and also to manufacture diffractive attenuators of laser radiation.
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