PECULIARITIES OF ADMITTANCE IN MOS STRUCTURES BASED ON MBE-GROWN MCT LAYERS
A. V. Yartsev
Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia E-mail: jartsev@ngs.ru
Pages: 358-362
Abstract
Admittance of MOS structures based on Hg1
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