Effect of argon on microwave plasma chemical vapor deposition of diamond coatings from an H2+CH4+Ar mixture activated in a microwave discharge
A.A. Emelyanov, V.A. Pinaev, M.Yu. Plotnikov, A.K. Rebrov, N.I. Timoshenko, I.B. Yudin
Kutateladze Institute of Thermophysics SB RAS, Novosibirsk, Russia
Keywords: diamond, microwave plasma, microwave plasma chemical vapor deposition, optical emission spectroscopy
Abstract
Results of an experimental study of the influence of argon addition on microwave plasma chemical vapor deposition of diamond from a hydrogen-methane mixture are reported. A specific feature of this method is the use of a high-velocity jet for transporting gases activated in a microwave plasma in the discharge chamber to the substrate located in the deposition chamber. Optical emission spectroscopy is used for systematic investigations of the microwave discharge plasma in the discharge chamber. Diamond coating samples obtained on the molybdenum substrate are studied by methods of scanning electron microscopy and Raman scattering spectrography.
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