STUDY OF THE OPTICAL METHODS OF FORMATION OF MULTILEVEL MICRORELIEF IN THE THIN FILMS OF A HYBRID PHOTOPOLYMER MATERIAL BASED ON THE BASIS OF THIOL-SILOXANE AND ACRYLATE OLIGOMERS
N. G. Mironnikov1,2, V. P. Korolkov1,2, D. I. Derevyanko3, V. V. Shelkovnikov3,4
1Institute of Automation and Electrometry, Siberian Branch, Russian Academy of Sciences, 630090, Novosibirsk, pr. Academika Koptyuga, 1
2Novosibirsk State University, 630090, Novosibirsk, ul. Pirogova, 2
3N. N. Vorozhtsov Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences, 630090, Novosibirsk, pr. Akademika Lavrentyeva, 9
4Novosibirsk State Technical University, 630073, Novosibirsk, pr. Karla Marksa, 20
Keywords: гибридный фотополимер, тиол-силоксан-акрилатные олигомеры, лазерная запись, фотолитография, многоуровневые дифракционные структуры, характеристическая кривая, hybrid photopolymer, thiol-siloxane-acrylate oligomers, laser recording, photolithography, multilevel diffraction structures, characteristic curve
Abstract
This paper describes a study of the optical methods of the formation of multilevel microrelief in the layers of a Gibrimer-TATS hybrid photopolymer material based on thiol-siloxane and acrylate oligomers. Halftone photolithography and direct laser recording are used to form multilevel structures 3.5 and 6 μm in height, respectively. The characteristic curves and photosensitivity of the material are determined. The process of preparation and treatment of the films is optimized, and it is discovered that the addition of the stages of pre- and post-exposure significantly affects the photosensitive properties of Gibrimer-TATS. The photopolymer is promising as a structural material for the formation of microstructured optical components.
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