Composition and structure of silicon carbonitride layers grown on Si(100)/(Fe, Ni, Co) substrates
N. I. Fainer, V. I. Kosyakov, Y. M. Rumyantsev, E. A. Maximovskii, S. A. Prokhorova, P. N. Gevko
Keywords: silicon carbonitride, structure, thin films, crystal shapes, Si(100) substrates, Fe-Ni-Co alloy, IR spectroscopy, Raman spectroscopy, AFM, SEM, SR-XRD
Pages: 821-827
Abstract
The phase and chemical composition of silicon carbonitride films obtained by plasma-enhanced chemical vapor deposition on Si(100) substrates and the same substrates covered by a layer of (Fe, Ni, Co) alloy is studied. It is shown that substrate metallization practically does not change the chemical composition of the film, but affects the ratio phases present in the film and the film nanostructure.
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