X-ray phOtoelectron and Auger spectroscopic study of the chemical composition of BCxNy films
V. G. Kesler, M. L. Kosinova, Y. M. Rumyantsev, V. S. Sulyaeva
Keywords: X-ray photoelectron spectroscopy, Auger spectroscopy, PECVD, BCxNy films
Pages: 710-717
Abstract
X-ray photoelectron and Auger spectroscopy are used to investigate the chemical composition of BCxNy films synthesized by PECVD from different initial gas mixtures in the temperature range 473-723 K. Main principles and features of the film formation are found. It is shown that the chemical composition of BCxNy films significantly depends on the synthesis parameters, which enables targeted control of their physical properties. The obtained data are discussed.
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