High-Purity Organosilicon Precursors for Plasma Chemical Deposition of Thin Dielectric Coatings
RUDOLF G. MIRSKOV, VLADIMIR I. RAKHLIN and MICHAIL G. VORONKOV
Favorskiy Irkutsk Institute of Chemistry, Siberian Branch of the Russian Academy of Sciences,
Ul. Favorskogo 1, Irkutsk 664033 (Russia); E-mail: mir@irioch.irk.ru
Pages: 511-515
Abstract
Ecologically safe methods of obtaining high-purity liquid organosilicon compounds containing Si
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